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美國專利法最新修正介紹暨美國最高法院及聯邦巡迴上訴法院最新判決研析

 

時間:2011/08/10 18:30-21:30

地點:台北市復興南路一段390號11樓1103會議室(中華民國職業訓練研究發展中心)

主辦單位:中華民國專利師公會

講題:美國專利法最新修正介紹暨美國最高法院及聯邦巡迴上訴法院最新判決研析

主講人:Professor Jeff Hawley

進修時數:3小時

 

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會員: NT$500

非會員: NT$1,000

 

J. Jeffrey Hawley

 

Professor Jeff Hawley joined Eastman Kodak as a chemical engineer in the Photographic Technology Division in July of 1969 immediately after graduating from NYU School of Engineering. In 1974, he transferred to Kodak's Patent Department and attended George Washington Law School, where he received a Juris Doctor degree in 1978. He was admitted to the New York State Bar in 1979. He retired from Kodak in July of 2006. In December of 2006, he became of counsel to the Technology and Intellectual Property Group of Nixon Peabody LLP.

 

Hawley served a variety of roles in the Kodak Patent Legal Staff. He became group patent counsel of the Patent Legal Staff Health Group in 1989, and the assistant general counsel, Patent Legal Staff in 1996. He is a former president of the Rochester Intellectual Property Law Association and a former president of PIPA (Pacific Intellectual Property Association). He was president of the Intellectual Property Owners Association (IPO) in 2004-5 and remains on the IPO Board of Directors. In 2005-6, Hawley served on the Executive Committee of the Association of Corporate Patent Counsel (ACPC) and was the treasurer.

 

He continues as an Emeritus member of ACPC. He is a member of American Intellectual Property Law Association (AIPLA).

 

He is a tennis player, a boater and a photographer. He is married with two sons, one in Durham NH and the other in Seattle WA.

 

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